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2018
First: formation of metal compounds on the targetWhere is the compound formed during the formation of the compound by the reactive sputtering process from the metal target surface?…
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2018
Can be divided into DC magnetron sputtering and RF magnetron sputtering.The DC sputtering method requires the target to transfer the positive charge obtained from the ion bombardmen…
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2018
The target is the target material for high-speed charge-energy particle bombardment. It is used in high-energy laser weapons. Different lasers with different power densities, differ…
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2018
The new target contains molybdenum with excellent adhesion to the base material such as a tool and a mold, and excellent lubricity. Therefore, the target for a substrate for improvi…
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